Sputtering of a LiF thin film (0.25 µm) surface by singly- (He+, Ne+ and Ar+) and doubly-charged (Ne++ and Ar++) ions with impact energies between 10 and 500 eV has been performed. The yield of sputtered Li+ and F- ions is only slightly higher for doubly-charged ions compared to singly-charged projectiles at impact energies below 100 eV, whereas the F+ yield is substantially increased if doubly-charged projectiles are used. The experimental data are explained within the framework of a model based on calculations by Walkup and Avouris. A comparison is given with former measurements on a LiF single crystal.
Corresponding author: P. Varga (varga).