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PACVD and Ellipsometry

Modern material technology relies increasingly on processes for surface modification and coating. Generally we are lacking a possibility to monitor the progress of such processes. Thus the outcome can only be analyzed after the end of the whole process cycle.

Picture of an Argon plasma in the PACVD apparatus.


We are proposing to use spectroscopic ellipsometry (SE) as an on-line monitoring tool. As an optical method, SE is not affected by high temperatures, process gases, plasmas, etc. SE can be used as a monitoring tool or a sensor for closed loop control of processes.