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The group "Surface and Plasma Technology" works in two main areas of research - plasma assisted deposition processes including aspects of plasma dynamics and plasma chemistry, and electron spectroscopy, including both, fundamental aspects of electron transport and the application for the analysis of surfaces and coatings.
Work in the area of plasma chemistry is presently focused to halogen containing atmospheres, as these are technologically important for a variety of processes ranging from deposition and etching to chemical waste treatment. Besides the research in plasma chemistry, we are in the framework of scientific and technological cooperations working on applications of plasmas ranging from arc cutting torches and industrial deposition equipment to miniature plasmas used for chemical analysis systems on chips.
Research in electron spectroscopy focuses on the electron transport in solids and associated software technology. Important techological lines of work will be materials analysis with very high spatial resolution and the metallurgy of hard coatings. Analytical capabilities are made available to other scientists and industrial companies in the framework of scientific cooperations or as simple contract work. Most important among present cooperations are our contributions to the centre of competence for applied electrochemistry (ECHEM) and the centre of competence for tribology (AC2T).

Staff Members: Betz, Dobrozemsky, Gebeshuber, Laimer, Störi, Werner

Overview of our Research Activity »
Overview of our Instrumentation and Service Analysis »

Latest News

Download a free demo version of SESSA here

5. May 2006 Database for electron spectroscopy

18. apr. 2006 Tutorial on electron spectroscopy by Wolfgang Werner

03. jan. 2006

SESSA released by NIST

22 Dec. 2005 ECASIA'05

29 Sep 05

ECASIA05 Conference in Vienna organized by our group

Research Topics


In close collaboration with the Austrian Center of Competence for Tribology we study tribologic films on real world samples using angle resolved electron spectroscopy for chemical analysis.

Momentum Vector Spectroscopy

We build a novel experimental setup for measuring momentum vectors of electrons being emitted from well defined solid surfaces under the impact of energetic electrons or ions ("MOmentum VEctor Spectroscopy - MOVES").

PACVD and Ellipsometry

Plasma-assisted chemical vapour deposition as well as plasma nitriding lack of an on-line process control. Therefore, we investigate the possibilities of spectroscopic ellipsometry for monitoring of surfaces under plasma treatment.


Simulation of Electron Spectra for Surface Analysis (SESSA)

A unique software tool for researchers active in the field of surface and interface analysis.

Fundamental research in quantitative electron spectroscopy of solid surfaces

We measure characteristics of the electron-solid interaction and develop methods for spectrum simulation and quantitative spectrum interpretation.

Interaction of beryllium with hydrogen plasma - nuclear fusion first wall investigations

After determination of the oxidation kinetics of beryllium in air, we are now investigating the interaction of beryllium with hydrogen plasma at temperatures around 400 °C in view of the suitability of beryllium as a first wall material for nuclear fusion devices.

Analytical Micro-plasmas

We are developing plasma cells integrated into micro-fluidic devices for Lab-on-Chip applications in cooperation with CASECT Ltd. and R.I.C.

Auger-Photoelectron Coincidence Spectroscopy (APECS)

Detailed information on the photoionization and Auger effect can be gained from APECS measurements

Electrochemical processes studied with in-situ XPS

In cooperation with the ECHEM - Center of Competence for Applied Electrochemistry we designed an apparatus to investigate the initial stages of the formation of electrochemical layers.


Molecular Dynamics und Monte-Carlo calculations on the erosion (sputtering) from surfaces and the growth of thin films on single crystal substrates.

Instrumentation and Analytical Services

Supersonic Vacuum Arc Jet

A plasma gun was developed which allows a supersonic expansion of the plasma plume into a vacuum vessel. It can be used for deposition experiments as well as plasma chemical investigations.

supersonic vacuum arc jet

High temperature rf reactor

An electrodeless rf discharge can be sustained in a tubular fused silica reactor situated within an electric furnace with a temperature of up to 1100 °C. Samples can be treated with various process gas mixtures either without or with plasma activation.

Mass spectrometry

The ultra high vacuum quadrupole mass spectrometers are used for a variety of analytical tasks, including process monitoring and outgasing.

Scanning Auger Microscope - Focused Ion Beam

A state of the art high resolution Scanning Auger system (VG microlab 310F) has been equipped with a focussed ion beam column, permitting micro-machining of samples in situ. The system is available for service analyses.


We use the X-ray photoelectron spectrometer to do some basic research such as determining the surface electron interaction and applied research in the field of electrochemical deposition of thin films as well as the formation of tribologic films.

Atmospheric Pressure Plasma Jet

We constructed an Atmospheric Pressure Plasma Jet to research stability conditions and behaviour of cold, atmospheric discharges.

Optical Spectroscopy

The equipment available permits optical emission spectroscopy in the UV, visible and near infrared ranges from 185 to 1100 nm.

Atomic Force Microscope

We have an ambient AFM combined with inverted optical microscope and top view optics.



We have a PACVD system for the production of hard coatings as well as for plasma nitriding with an attached spectroscopic ellipsometer.

Sample Treatment and Preparation

Our facilities for sample treatment and preparation include equipment for cutting, polishing, ball cratering, heating and cleaning.


A setup developed by Prof. Dobrozemsky permits quantitative outgassing measurements from room temperature to 2000 °C.