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The group "Surface and Plasma Technology" works in two main areas of research - plasma assisted deposition processes including aspects of plasma dynamics and plasma chemistry, and electron spectroscopy, including both, fundamental aspects of electron transport and the application for the analysis of surfaces and coatings.
Work in the area of plasma chemistry is presently focused to halogen containing atmospheres, as these are technologically important for a variety of processes ranging from deposition and etching to chemical waste treatment. Besides the research in plasma chemistry, we are in the framework of scientific and technological cooperations working on applications of plasmas ranging from arc cutting torches and industrial deposition equipment to miniature plasmas used for chemical analysis systems on chips.
Research in electron spectroscopy focuses on the electron transport in solids and associated software technology. Important techological lines of work will be materials analysis with very high spatial resolution and the metallurgy of hard coatings. Analytical capabilities are made available to other scientists and industrial companies in the framework of scientific cooperations or as simple contract work. Most important among present cooperations are our contributions to the centre of competence for applied electrochemistry (ECHEM) and the centre of competence for tribology (AC2T).

Staff Members: Betz, Dobrozemsky, Gebeshuber, Laimer, Störi, Werner

Overview of our Research Activity »
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